UPDATED : 23 May 2007
About the Seminar ... Topics
Organized by
VLSI Society of India |
One-day Seminar on Design For Manufacturability and ReliabilityJuly 27, 2007, Kolkata, India Venue: The SENATOR Hotel |
In cooperation with
|
Design For Manufacturability and Reliability
Duration: Full day
Target Audience: Practicing Engineers, Design Professionals, Students and Academics
Topics:
1. Introduction
2. Manufacturing Defects v Particulate defects v Large parametric excursion v Lithographic aberrations (e.g., problems related to diffraction, focal image plane and dose)
3. Defect Modeling v For critical yield (critical area calculation and optical proximity correction) v For parametric yield (litho and resist simulation)
4. Yield Models (with and w/o redundancy).
5. Defect Tolerance Techniques v Architecture based techniques (memories, processors, PLAs etc) v Circuit/layout hardening techniques v Algorithm based tolerance v Statistical methods
6. Reliability Issues v Hot Carrier v Thermal v Electro-migration v Gate oxide problems v Testing for reliability problems v Soft-error
Download announcement with registration form PDF 94KB Please also register using the online registration form at http://vlsi-india.org/vsi/activities/reg.shtml apart from sending the filled hardcopy of registration form. Spot-registration subject to availability at the after deadline rates against DD or Cash. |
About the Seminar ... Topics
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